Creation of indium microcontacts by dint of the FPN-20-ISO photoresist in a big integrated circuit reading a photosignal N. I. Batyrev Moscow State Academy of Delicate Chemical Technology named after M. V. Lomonosov 86 Vernadsky av., Moscow, 119571, Russia E. A. Klimanov, V. P. Liseykin, D. R. Nadrov, M. V. Sednev Orion R&P Association 46/2 Enthusiasts road, Moscow, 111402, Russia E-mail: orion@orion-ir.ru The explosive method is used for creation of indium microcontacts (step 30 m) by using negotiable photoresist. <...> This method lets to a large degree of removing defects, inherent for method of direct photolithography: floating chemical etching by all surface of samples, chemical influence on inferior technological layers, adducing to high density off defects. <...>