Машиностроение

Generally all the chemical process industries involve a huge number of major reactions taking place which are either exothermic or endothermic in nature. These reactions are performed in different units of chemical process industries which include: distillation columns, evaporators, heat exchangers, chemical reactors, etc. All these units are integrated in a particular manner so that the chemical reactions can be carried out efficiently and safely. Chemical reactors are the most important unit of any chemical industry. Continuous Stirred Tank Reactors (CSTRs) are the most common chemical reactors used for the continuous mixing of reactants entering freely into it. CSTRs are the highly dynamic and nonlinear units with wide operating ranges. The reactants at particular concentration and temperature are entered in CSTR. So, concentration of product and temperature are two important parameters of CSTR which are to be controlled, while operating CSTR at steady state. In the jacketed CSTR the temperature is maintained by removing heat in the reactor in case of exothermic chemical reaction. The concentration of the product in CSTR is maintained by maintaining the concentration of inlet components. Also the concentration of the product can be affected by change in temperature of CSTR. So, maintaining the temperature of CSTR also leads to control of concentration of the product in CSTR. Being a highly nonlinear unit of chemical industries, CSTR has attracted researchers during last few decades. A lot of different methodologies have been proposed by researchers for the parameters of concern in CSTR. The temperature of CSTR is most crucial parameter and requires a precise and efficient control. So, this paper presents a brief review of some of the control techniques and systems proposed for CSTR for temperature control.

Журнал издается с 2014г., посвящен вопросам нанотехнологий, возникающим в различных теоретических и практических научных разработках. Использование математических моделей и вычислительных машин становится частью технологического процесса создания систем на молекулярном уровне. В журнале также рассматриваются многомасштабные вычислительные модели, определяющие успех моделирования наносистем.

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